Our additives can enable innovative developments for electrification and digitalization applications.
Our performance additives have a broad application in the fields of electrification and digitalization. Our additives can improve the efficiency and effectiveness of chemical mechanical planarization (CMP), a process used to planarize the surface of semiconductor wafers and other materials. Furthermore, our performance additives possess the remarkable ability to elevate the efficiency of displays and electrophotography technologies, leading to heightened image quality and enhanced reliability. These additives also find excellent utility in additive manufacturing, commonly known as 3D printing, where they can bolster the strength and durability of 3D printed components. As a result, they greatly broaden the range of digitalization applications, unlocking numerous possibilities in different portfolios.
CHEMICAL MECHANICAL PLANARIZATION
Our fumed silica manufacturing technology, together with our statistical process control methods, have enabled us to further refine our products while offering consistent and reliable performance to the CMP industry.Read More
Manufacturers involved in the development of displays need to balance the tradeoff between light shielding and electrical percolation threshold in black pigment. To this end, they search for unique particles to add anti-reflection effect on display materials.Read More
Our global reach enables us to partner closely with our customers to meet the highest standards for performance, quality and service for electrophotography.Read More
We offer several solutions that can support the performance needs of AM applications.Read More